Skip navigation

putin IS MURDERER

Please use this identifier to cite or link to this item: https://oldena.lpnu.ua/handle/ntb/51784
Full metadata record
DC FieldValueLanguage
dc.contributor.authorShepida, Mariana
dc.contributor.authorZozylya, Galyna
dc.contributor.authorDobrovetska, Oksana
dc.coverage.temporal23–25 November 2018, Lviv
dc.date.accessioned2020-06-09T07:07:42Z-
dc.date.available2020-06-09T07:07:42Z-
dc.date.created2018-11-22
dc.date.issued2018-11-22
dc.identifier.citationShepida M. Modification of the Silicon Surface by the Gold Nanoparticle by Galvanic Replacement / Mariana Shepida, Galyna Zozylya, Oksana Dobrovetska // Litteris et Artibus : proceedings, 23–25 November 2018, Lviv. — Lviv : Lviv Politechnic Publishing House, 2018. — P. 250–253. — (7th International academic conference “Chemistry & chemical technology 2018” (CCT-2018)).
dc.identifier.isbn978-966-941-294-2
dc.identifier.urihttps://ena.lpnu.ua/handle/ntb/51784-
dc.description.abstractThe results of studies of the deposition of gold nanoparticles on the surface of silicon by galvanic substitution are presented. The process conditions under which a nano-sized precipitate is formed in the organic aprotic solvents are investigated. The effect of temperature and duration of galvanic substitution on the morphology of the modified surface, the geometry of the sediment particles and their size distribution is studied.
dc.format.extent250-253
dc.language.isoen
dc.publisherВидавництво Львівської політехніки
dc.publisherLviv Politechnic Publishing House
dc.relation.ispartofLitteris et Artibus : proceedings, 2018
dc.subjectgalvanic replacement
dc.subjectnanoparticles
dc.subjectgold
dc.subjectnanofilm
dc.subjectsilicon surface
dc.subjectaprotic solvents
dc.titleModification of the Silicon Surface by the Gold Nanoparticle by Galvanic Replacement
dc.typeConference Abstract
dc.rights.holder© Національний університет “Львівська політехніка”, 2018
dc.contributor.affiliationLviv Polytechnic National University
dc.format.pages4
dc.identifier.citationenShepida M. Modification of the Silicon Surface by the Gold Nanoparticle by Galvanic Replacement / Mariana Shepida, Galyna Zozylya, Oksana Dobrovetska // Litteris et Artibus : proceedings, 23–25 November 2018, Lviv. — Lviv : Lviv Politechnic Publishing House, 2018. — P. 250–253. — (7th International academic conference “Chemistry & chemical technology 2018” (CCT-2018)).
dc.relation.references[1] A. Raygani, L. Magagnin. “Gold metallization of silicon by galvanic displacement”. Electrochemical Society Transactions, vol. 41, pp. 3-8, 2012.
dc.relation.references[2] H. Itasaka, M. Nishi, M. Shimizu, and K. Hirao. “Growth of nanogold at interfaces between locally induced naked silicon surfaces and pure HAuCl4 solutions”. Journal of The Electrochemical Society, vol. 163, pp. D743–D746, 2016.
dc.relation.references[3] A. Lahiri and S.-I. Kobayashi. “Electroless deposition of gold on silicon and its potential applications: review”. Surface Engineering, vol. 32, pp. 321-337, 2016,
dc.relation.references[4] S.S. Djokic. “Galvanic Deposition of Copper, Silver and Gold on Silicon Surfaces from Fluoride Free Aqueous Solutions”. Electrochemical Society Transactions, vol. 75, pp. 15–25, 2017.
dc.relation.references[5] J. Kye, M. Shin, B. Lim, J.-W. Jang. “Platinum monolayer electrocatalyst on gold nanostructures on siliconfor photoelectrochemical hydrogen evolution”. American Chemical Society, vol. 7, pp. 6017–6023, 2013.
dc.relation.references[6] A. Gutes, C. Carraro and R. Maboudian. “Ultrasmooth gold thin films by self-limiting galvanic displacement on silicon”. American Chemical Society Applide Material Interfaces, vol.3, pp. 1581–1584, 2011.
dc.relation.references[7] N. Yamada, H. Atsushiba, S. Sakamoto, N. Fukumuro, et al. “Effect of epitaxial growth of gold nanoparticles on Si substrates on adhesion of electrolessly deposited metal films”. Electrochemical Society Transactions, vol. 69, pp. 59-63, 2015.
dc.relation.references[8] S.Y. Sayed, F. Wang, M. Malac, A. Meldrum, et al. “Heteroepitaxial growth of gold nanostructures on silicon by galvanic displacement”. American Chemical Society NANO, vol. 3, pp. 2809–2817, 2009.
dc.relation.references[9] L. Magagnin, R. Maboudian and C. Carraro. “Gold deposition by galvanic displacement on semiconductor surfaces: effect of substrate on adhesion”. Journal of the Physical Chemistry, vol.106, pp. 401-407, 2002.
dc.relation.references[10] O. Kuntyi, M. Shepida, L. Sus, G. Zozulya, S. Korniy. “Modification of Silicon Surface with Silver, Gold and Palladium Nanostructures via Galvanic Substitution in DMSO and DMF Solutions”. Chemistry & Chemical Technology, vol. 12, pp. 305-309, 2018.
dc.relation.references[11] O.Ya. Dobrovets’ka, O.I. Kuntyi, G.I. Zozulya, I.V. Saldan, O.V. Reshetnyak. “Galvanic Deposition of Gold and Palladium on Magnesium by the method of Substitution”. Materials Science, vol. 51, pp. 418– 423, 2015.
dc.relation.referencesen[1] A. Raygani, L. Magagnin. "Gold metallization of silicon by galvanic displacement". Electrochemical Society Transactions, vol. 41, pp. 3-8, 2012.
dc.relation.referencesen[2] H. Itasaka, M. Nishi, M. Shimizu, and K. Hirao. "Growth of nanogold at interfaces between locally induced naked silicon surfaces and pure HAuCl4 solutions". Journal of The Electrochemical Society, vol. 163, pp. D743–D746, 2016.
dc.relation.referencesen[3] A. Lahiri and S.-I. Kobayashi. "Electroless deposition of gold on silicon and its potential applications: review". Surface Engineering, vol. 32, pp. 321-337, 2016,
dc.relation.referencesen[4] S.S. Djokic. "Galvanic Deposition of Copper, Silver and Gold on Silicon Surfaces from Fluoride Free Aqueous Solutions". Electrochemical Society Transactions, vol. 75, pp. 15–25, 2017.
dc.relation.referencesen[5] J. Kye, M. Shin, B. Lim, J.-W. Jang. "Platinum monolayer electrocatalyst on gold nanostructures on siliconfor photoelectrochemical hydrogen evolution". American Chemical Society, vol. 7, pp. 6017–6023, 2013.
dc.relation.referencesen[6] A. Gutes, C. Carraro and R. Maboudian. "Ultrasmooth gold thin films by self-limiting galvanic displacement on silicon". American Chemical Society Applide Material Interfaces, vol.3, pp. 1581–1584, 2011.
dc.relation.referencesen[7] N. Yamada, H. Atsushiba, S. Sakamoto, N. Fukumuro, et al. "Effect of epitaxial growth of gold nanoparticles on Si substrates on adhesion of electrolessly deposited metal films". Electrochemical Society Transactions, vol. 69, pp. 59-63, 2015.
dc.relation.referencesen[8] S.Y. Sayed, F. Wang, M. Malac, A. Meldrum, et al. "Heteroepitaxial growth of gold nanostructures on silicon by galvanic displacement". American Chemical Society NANO, vol. 3, pp. 2809–2817, 2009.
dc.relation.referencesen[9] L. Magagnin, R. Maboudian and C. Carraro. "Gold deposition by galvanic displacement on semiconductor surfaces: effect of substrate on adhesion". Journal of the Physical Chemistry, vol.106, pp. 401-407, 2002.
dc.relation.referencesen[10] O. Kuntyi, M. Shepida, L. Sus, G. Zozulya, S. Korniy. "Modification of Silicon Surface with Silver, Gold and Palladium Nanostructures via Galvanic Substitution in DMSO and DMF Solutions". Chemistry & Chemical Technology, vol. 12, pp. 305-309, 2018.
dc.relation.referencesen[11] O.Ya. Dobrovets’ka, O.I. Kuntyi, G.I. Zozulya, I.V. Saldan, O.V. Reshetnyak. "Galvanic Deposition of Gold and Palladium on Magnesium by the method of Substitution". Materials Science, vol. 51, pp. 418– 423, 2015.
dc.citation.conference8th International youth science forum «Litteris et Artibus»
dc.citation.journalTitleLitteris et Artibus : proceedings
dc.citation.spage250
dc.citation.epage253
dc.coverage.placenameЛьвів
dc.coverage.placenameLviv
Appears in Collections:Litteris et Artibus. – 2018 р.

Files in This Item:
File Description SizeFormat 
2018_Shepida_M-Modification_of_the_Silicon_250-253.pdf839.35 kBAdobe PDFView/Open
2018_Shepida_M-Modification_of_the_Silicon_250-253__COVER.png466.54 kBimage/pngView/Open
Show simple item record


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.