https://oldena.lpnu.ua/handle/ntb/5545
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Buryy, O. | - |
dc.contributor.author | Ubizskii, S. | - |
dc.contributor.author | Syvorotka, I. I. | - |
dc.contributor.author | Becker, K.-D. | - |
dc.date.accessioned | 2010-06-18T09:56:42Z | - |
dc.date.available | 2010-06-18T09:56:42Z | - |
dc.date.issued | 2009 | - |
dc.identifier.citation | Buryy O. Investigation of the chromium ions recharging kinetics in Cr,Mg:YAG epitaxial films during high-temperature annealing / O. Buryy, S. Ubizskii, I. I. Syvorotka, K.-D. Becker // Oxide materials for electronic engineering – fabrication, properties and application OMEE-2009 : international scientific workshop, June 22–26, 2009, Lviv, Ukraine : book of abstracts / Lviv Polytechnic National University. – Lviv, 2009. – P. 144. | uk_UA |
dc.identifier.uri | https://ena.lpnu.ua/handle/ntb/5545 | - |
dc.language.iso | en | uk_UA |
dc.publisher | Видавництво національного університету „Львівська політехніка” | uk_UA |
dc.subject | film | uk_UA |
dc.subject | kinetic | uk_UA |
dc.subject | crystal | uk_UA |
dc.title | Investigation of the chromium ions recharging kinetics in Cr,Mg:YAG epitaxial films during high-temperature annealing | uk_UA |
dc.type | article | uk_UA |
Appears in Collections: | Оксидні матеріали електронної техніки – отримання, властивості, застосування. – 2009 р. |
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